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GLBEclipse Techwear Outfit – High-Poly 3D Asset
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I specialize in creating high-quality, cinematic 3D apparel. My focus is on delivering detailed, production-ready assets—ranging from high-poly cinematic pieces to optimized game-ready models—designed to elevate any digital project.
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Extended Use License (IP Restricted)
This item comes with our Extended Use Licensing. This means that you may use the model in a variety of mediums and applications. But, because certain intellectual property depicted in this model may not be affiliated with or endorsed by the original rights holder, this model is subject to an Editorial Use Only Restriction which limits the ways in which you may use this model.
For full license terms, see our 3D Content Licensing Agreement
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Eclipse Techwear Outfit – High-Poly 3D Asset
Product Title:
ECLIPSE Techwear Outfit – High-Poly 3D Asset (CLO3D/Marvelous Designer)
Description:
Elevate your digital fashion and gaming projects with the ECLIPSE Techwear Outfit, a meticulously crafted high-poly asset designed for cinematic quality and versatility. This set captures a sharp, modern aesthetic with intricate details, perfect for high-end character design, concept art, and digital portfolios.
Key Technical Specifications:
Source Files: Includes ZPRJ (Marvelous Designer/CLO3D) for full customization and simulation control.
Geometry: High-Poly model with Quad-based mesh topology.
Format Flexibility: Available in OBJ and FBX formats for seamless integration into your preferred 3D software.
Textures: Includes professional 4K Textures for superior visual fidelity.
Customization: Comes with the Substance Painter file (.spp), allowing you to easily customize patterns, fabrics, and colors to fit your unique project needs.
Workflow Ready: UVs are professionally unwrapped and ready for texturing.
Important Notes for Buyers:
Mesh State: This is a high-poly asset. It has not been retopologized for real-time game engines.
Rigging: The model is not rigged.
Simulation: Created with a Particle Distance of 5, ensuring high detail and clean cloth simulation in CLO3D/Marvelous Designer.
Rate & Review:
If you enjoy this product, please rate and leave a review.
Your feedback helps me improve and create more high-quality 3D outfits for artists and designers.
Thank you for your support!
Got questions? Contact us – we’re happy to help!
ECLIPSE Techwear Outfit – High-Poly 3D Asset (CLO3D/Marvelous Designer)
Description:
Elevate your digital fashion and gaming projects with the ECLIPSE Techwear Outfit, a meticulously crafted high-poly asset designed for cinematic quality and versatility. This set captures a sharp, modern aesthetic with intricate details, perfect for high-end character design, concept art, and digital portfolios.
Key Technical Specifications:
Source Files: Includes ZPRJ (Marvelous Designer/CLO3D) for full customization and simulation control.
Geometry: High-Poly model with Quad-based mesh topology.
Format Flexibility: Available in OBJ and FBX formats for seamless integration into your preferred 3D software.
Textures: Includes professional 4K Textures for superior visual fidelity.
Customization: Comes with the Substance Painter file (.spp), allowing you to easily customize patterns, fabrics, and colors to fit your unique project needs.
Workflow Ready: UVs are professionally unwrapped and ready for texturing.
Important Notes for Buyers:
Mesh State: This is a high-poly asset. It has not been retopologized for real-time game engines.
Rigging: The model is not rigged.
Simulation: Created with a Particle Distance of 5, ensuring high detail and clean cloth simulation in CLO3D/Marvelous Designer.
Rate & Review:
If you enjoy this product, please rate and leave a review.
Your feedback helps me improve and create more high-quality 3D outfits for artists and designers.
Thank you for your support!
Got questions? Contact us – we’re happy to help!
